SUSS MicroTec MA-6 Mask Aligner
SUSS Microtec MA6 Gen3 Mask Aligner
Tool ID: MA-01
Location: Bay 5
The SUSS MA6 Mask Aligner is set up for piece parts to 6″ wafers, with first mask, top-side alignment, bottom-side alignment, and flood exposure. Mask alignment is possible for both contact and proximity exposure processes. Exposures can be performed with gaps programmable from 10 um to 300 um in 1 um increments. Automatic wedge error compensation (WEC) is used to ensure that the mask and wafer are parallel. The lamp is a 1000 W Hg-Arc lamp. Integrated light level sensing ensures proper exposure doses in both 365nm and 405nm, even as the lamp degrades. For some applications it can be beneficial to eliminate wavelengths below 365nm using an installable long pass filter.
Applications
* First mask exposure of resist-coated samples for patterning
* Aligned mask exposure of resist-coated samples for patterning
* Flood exposure of resist-coated samples for image reversal
* Flood exposure of samples for further cross-linking of resist/resin
