Sandvik LPCVD & Anneal Furnace
Sandvik LPCVD & Anneal Furnace
TOOL ID: CVD-02
The Sandvik LPCVD consists of 4 horizontal tubes:
Tube 1: Wet/Dry Silicon Oxide deposition.
Tube 2: Low Stress Silicon Nitride deposition.
Tube 3: Clean anneal.
Tube 4: General anneal.
The tool is configured for 100 mm (4″ wafers) and can process up to 50 wafers at a time.
Sandvik LPCVD & Anneal Furnace
