Heidelberg DWL 66+ Laser Writer
Heidelberg DWL 66+ Laser Writer
Tool ID: LW-01
Location: Bay 4
The DWL 66+ laser writing system can be used for the patterning of photomasks, iterative testing of patterns as well as direct writing for small or temporary use cases. Global and feature alignment is available for direct write layers, using both top-side and bottom-side cameras. The laser is 405nm wavelength (h-line).
Lens & Resolution
- 2 mm lens : 600 nm
- 10 mm lens: 2 µm
Applications
- Patterning of photomasks
- Direct laser writing on substrates, from 6″ wafers down to 10mm x 10mm pieces
Allowed Materials
- Mask Plates — available in the QNF Stockroom pre-coated with AZ1500 and IP3500
- Resists — must be compatible with h-line exposure. Includes S1800 series, KL5300 series, LOR
Heidelberg DWL 66+ Laser Writer
