PIE Scientific Tergeo-Plus Plasma Cleaner
DE-09: PIE Scientific Tergeo-Plus
The PIE Scientific Tergeo-Plus Plasma Cleaner is an RF etcher designed for sample cleaning and ashing of resist with a maximum power of 500 W. It is equipped with three process gasses, O2, Ar, and H2O. It is capable of direct or downstream plasma, pulsed plasma mode, and has in-situ plasma monitoring for precise process control. The tool can hold samples from piece parts to a single 6” wafer. It can also hold a cassette of 25 4” wafers.
PIE Scientific Tergeo-Plus Plasma Cleaner
