IntlVac Nanochrome Electron Beam Evaporator
IntlVac Nanochrome Electron Beam Evaporator
The IntlVac Nanochrome Electron Beam Evaporator has a base process chamber pressure in the low e-8 Torr range with substrate heating and ozone purging capabilities. Deposition rates are monitored by an automated magazine of 6MHz crystals. The tool can be used to process a single 4 inch wafer at a time or a selection of small chips/pieces.
IntlVac Nanochrome Electron Beam Evaporator
